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Precision control of thermal transport in cryogenic single-crystal silicon devices

机译:低温单晶热传输的精确控制   硅器件

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摘要

We report on the diffusive-ballistic thermal conductance of multi-modedsingle-crystal silicon beams measured below 1 K. It is shown that the phononmean-free-path $\ell$ is a strong function of the surface roughnesscharacteristics of the beams. This effect is enhanced in diffuse beams withlengths much larger than $\ell$, even when the surface is fairly smooth, 5-10nm rms, and the peak thermal wavelength is 0.6 $\mu$m. Resonant phononscattering has been observed in beams with a pitted surface morphology andcharacteristic pit depth of 30 nm. Hence, if the surface roughness is notadequately controlled, the thermal conductance can vary significantly fordiffuse beams fabricated across a wafer. In contrast, when the beam length isof order $\ell$, the conductance is dominated by ballistic transport and iseffectively set by the beam area. We have demonstrated a uniformity of $\pm$8%in fractional deviation for ballistic beams, and this deviation is largely setby the thermal conductance of diffuse beams that support themicro-electro-mechanical device and electrical leads. In addition, we havefound no evidence for excess specific heat in single-crystal silicon membranes.This allows for the precise control of the device heat capacity with normalmetal films. We discuss the results in the context of the design andfabrication of large-format arrays of far-infrared and millimeter wavelengthcryogenic detectors.
机译:我们报告了在1 K以下测量的多模单晶硅束的扩散弹道热导。研究表明,声子平均路径$ \ ell $是束表面粗糙度特性的强函数。即使在表面相当光滑的5-10nm rms且峰值热波长为0.6μm的漫射光束中,其长度远大于1μm的漫射光束,也会增强这种效果。在具有凹坑表面形态和特征凹坑深度为30 nm的光束中观察到共振声子散射。因此,如果未适当地控制表面粗糙度,则对于在晶片上制造的漫射束,热导会显着变化。相反,当射束长度约为$ \ ell $时,电导由弹道传输控制,并由射束面积有效地设定。我们已经证明弹道光束的分数偏差具有$ \ pm $ 8%的均匀性,并且这种偏差主要由支撑微机电设备和电线的扩散光束的热导率来设定。此外,我们还没有发现单晶硅膜中存在比热过多的证据,这可以用普通金属膜精确控制器件的热容量。我们在设计和制造远红外和毫米波波长低温探测器的大型阵列的背景下讨论结果。

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